• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    The invention relates to capacitive probe with a special shielding, in order to be able to measure small differences in distance which correspond to small differences in capacitance. For this purpose, a first and a second electrode are located within a shield which is connected to the ground potential. A coupling pin is located within an opening of the first electrode and, in a given instance, within a recess. A dielectric is placed between the shield, the electrodes and coupling pin, and the dielectric may be divided. The electrodes shield the coupling pin from the shield. The shield has a decoupling projection between the first and second electrodes, so that the capacitances between the first and second electrodes (as well as the capacitance between the shield and the coupling pin) are very small. With the capacitive measuring probe, distances to a conductive material are measured, as well as the position of the bordering edges of the conductive material.
    公开号:SU1015243A1
    申请号:SU797770603
    申请日:1979-06-06
    公开日:1983-04-30
    发明作者:Рисланд Эберхард；Вагнер Вольфганг；Опитц Гюнтер
    申请人:Феб Электромат Им Комбинат Месэлектроник /Инопредприятие/；
    IPC主号:
    专利说明:

    The invention relates to a measuring and measuring technique and can be used to measure the distance between a capacitive measuring probe and an electrically conductive material. In this case, with the help of a capacitive measuring probe, smooth changes in thickness and the location of the bounding edges of an electrically conductive material can be measured. A capacitive measuring probe used in a gauge according to DE-AS 2 kkB 205 is known, in which the probe electrode protrudes inside the measured volume. Under the influence of the loading material, the field of the probe electrode is deformed compared to the state without the presence of loading material. As a result, the capacitance ratios change and an indication is made in the data processing circuit. Due to inadequate shielding, this capacitive probe is unsuitable for measuring small distances between the probe electrode and the monitored electrically conductive surface. A special design of the shielding device for multi-track electromagnetic heads for recording and / or reproducing signals is described in the patent DD-WP129 .. In this case, the shielding is formed from a combination of electrically conducting and dielectric layers that make up the shielding plates and from common to all magnetic systems plates for deformation of the field. The shielding plates in this case are placed between separate magnetic systems and increase the crosstalk attenuation. The purpose of the invention is to create a capacitive measuring probe, suitable for determining the smallest capacitances between the measuring probe and the electrically conductive material. and to register them. In this case, the design of the probe should be simple and have a small measuring area. The invention relates to a capacitive measuring probe, in which, by means of a special design, the shielding is almost completely suppressed by earth-moving capacitance and interfering connections, due to which it is possible to measure the smallest distances to the conductive surface. The capacitive measuring loop consists of a grounded shield in the form of a hollow part closed on top. Within the shield, there is a first electrode terminating at the same level as the shield. A second electrode is placed over the first electrode. Inside the first electrode and in some cases in the recess or groove in the second electrode is placed the third electrode, made in the form of a coupling pin with the measuring platform, the latter ending at the same level with the screen and the first electrode. The space between the screen, the electrons and the connecting pin is filled with a dielectric. At the same time, the thickness of the legs between the individual electrically conductive elements of the same magnitude. Within the screen, above the second electrode, is an amplifying element. The first electrode is connected to the input of the measuring rod through the first opening of the screen, and the second electrode is connected to the input of the amplifying element, which through the second hole in the screen is connected to the output of the capacitive measuring rod. It is advantageous if the amplifying element is a field effect transistor, the gate of which is the input of the amplifying element, the drain is its output, and the source is connected to the screen. The screen between the first and second electrodes is provided with an isolating protrusion. This leads to a decrease in interfering communication between the electrodes. It turns out to be advantageous if the measuring area of the pin slightly extends beyond the outer ends of the screen and the first electrode, since if the measured surface comes in contact with an isolated from all sides communication pin, the occurrence of r.3 is excluded. between the rest of the conductive parts of the loop. The design configuration of the measuring rod must be specific to different measuring methods. If distance is to be measured predominantly, then the circular section of the screen will be beneficial. To determine the location of the Hbix edge of the edges of the electrically conductive material, a rectangular cross section of the screen is advantageous. . As a result of the distance change, the capacitances between the shield, the first electrode and the connecting pin change. At the moment of application of alternating voltage to the input of the loop at its output, an output alternating voltage appears: depending on the distance to the conductive surface. Fig. 1 shows the layout of a capacitive measuring stick relative to the sieve / 1 on a conductive surface; figure 2 - cross-section of the hoop; FIG. 3 shows a schematic of the capacitor loop; in fig. and FIG. 5 shows other variants of the process, the filling of the capacitive probe; The capacitive measuring rod 1 is adapted for measuring the distance d to the electrically conductive material 2 or to determine the location of the bounding edges of the electrically conductive material 2. The capacitive measuring electrode 1 contains a grounded shield 3 in the form of a hollow core closed at the top. Inside the screen 3, the first electrode k is located, above which is located the second electrode 5 In the electrode hole k and near the electrode 5 times the connecting pin 6 of communication, having a measuring platform 7. At that, the measuring platform 7 does not significantly protrude beyond the area formed by the lower ends the screen 3 and the electrode (in order to avoid the appearance of a short-circuit between the electrically conductive parts of the probe when it is installed on the electrically conductive material 2. In this case, the space between the screen 3, the electrodes, 5 and the connecting pin 6 It is filled with a dielectric with low dielectric permeability, so that these parts are isolated from each other galvanically, and you should choose the same thickness of the wall of the dielectric 8 between the individual parts. between the electrodes k and S there is an unbinding protrusion 10, which reduces the risk of interfering communication between these electrodes. an amplifying element and the output of the amplifier via the second apertures 12 in the screen 3 is connected to output A MCC. The principle of operation of the capacitive probe is clarified on the basis of the replacement circuit (Fig. 3). . The following capacitances exist: capacitance Sc between the electrode C and pin 6 of the communication, capacitance C between pin 6 and electrode 5 and the measuring capacitance C between pin 6 and below; screen potential by conductive material 2. In addition, there are parasitic capacitances Cp between connecting pin 6 and screen 3 and Cp between electrodes A and 5, the magnitudes of which are kept to a minimum by making shielding lug 10 between them. Other capacitances exist between the screen 3 and the electric capacitance C, as well as between the screen 3 and the electrode 5c connecting the input capacitance 9 in parallel with the capacitance element 9 with the capacitance Sdl, the capacitance distorts the measurement result, and its interfering effect only affects the alternating voltage nutrition yq. Therefore, capacitance C „is shown in FIG. 3 conditionally. If the voltage UQ of the AC power is connected to the input E, then the voltage on the capacitance measuring capacitances mentioned above (capacitance 1) is divided. Because of the presence of the coupling tab 10, the parasitic capacitance of the Medium is kept at negligibly small limits. Due to this, for the output voltage Od depending on the measured distance d. W2 K. (v,) A primary goal is to maintain the parasitic capacitance Cp small due to the choice of a special design of the center, since the influence from Cp suppresses its own Measurement effect. The variable capacitance is: the capacitance Su is the specified variable distance d of the measurement site 7 communication pin 6 to the conductive surface 2.
    It is recognized as an invention according to the results of the examination carried out by the Office for the Invention of the German Lemokraticheskaya Republic.
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    权利要求:
    Claims (3)
    [1]
    1. CAPACITIVE MEASURING PROBE for measuring small distances to the surface of electrically conductive materials, containing a hollow electrically conductive screen and placed inside two electrodes, separated by a dielectric from each other, and an amplifying element connected to one of the electrodes, connected to one another in that it is equipped with a third electrode made in the form of a communication pin 6 with a measuring pad 7 at its outer end, a communication pin 6 is placed inside the first electrode 4 and is separated from it and from the second electrode 5 by a dielectric, the second The electrode is placed above the first electrode and is separated from it by the decoupling protrusion 10 of the electrically conductive screen 3 * and the amplifying element 9 is placed inside the screen 3 and is made in the form of a field effect transistor. .
    [2]
    2. Capacitive measuring probe pop. 1, characterized in that the measuring platform 7 of the communication pin 6 is at the same level with the outer ends of the first electrode 4 and the screen 3.
    [3]
    3. The capacitive measuring probe according to claim 1, with the exception of the fact that the measuring platform 7 of the communication pin 6 extends beyond the outer ends of the first electrode 4. and the screen 3 ·
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    同族专利:
    公开号 | 公开日
    DE2920491A1|1980-01-17|
    DE2920491C2|1988-07-28|
    US4311959A|1982-01-19|
    JPS5536793A|1980-03-14|
    DD136897A1|1979-08-01|
    FR2429411B3|1982-05-28|
    CS218893B1|1983-02-25|
    GB2023847B|1983-04-27|
    CH639754A5|1983-11-30|
    GB2023847A|1980-01-03|
    FR2429411A1|1980-01-18|
    JPS63141406U|1988-09-19|
    SE7905398L|1979-12-21|
    SE436151B|1984-11-12|
    HU182731B|1984-03-28|
    DD136897B1|1981-03-25|
    BG32528A1|1982-08-16|
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    GB9021448D0|1990-10-03|1990-11-14|Renishaw Plc|Capacitance sensing probe|
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    法律状态:
    优先权:
    申请号 | 申请日 | 专利标题
    DD20613878A|DD136897B1|1978-06-20|1978-06-20|CAPACITIVE MEASURING SENSOR|
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